• High Purity Tantalum Metal Sputtering Target for Thin Film Coating
  • High Purity Tantalum Metal Sputtering Target for Thin Film Coating
  • High Purity Tantalum Metal Sputtering Target for Thin Film Coating
  • High Purity Tantalum Metal Sputtering Target for Thin Film Coating
  • High Purity Tantalum Metal Sputtering Target for Thin Film Coating

High Purity Tantalum Metal Sputtering Target for Thin Film Coating

Condition: New
Certification: ISO9001
Standard: GB
Material: Tantalum
Application: Hydrogeneration
Shape: Round
Customization:
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Overview

Basic Info.

Model NO.
Ta
Chemical Composition
Tantalum
Transport Package
Vacuum Packed or Per Customer′s Request.
Trademark
UMM
Origin
Guangdong, China
Production Capacity
10000000 Kilogram/Kilograms Per Month

Product Description

Product Description

High purity Tantalum metal Sputtering Target for thin film coating,Titanium/Rhodium /Ruthenium Sputtering Target

Product manual

Tantalum, a metallic element, mainly exists in tantalite and co-exists with niobium. The texture of tantalum is very hard, the
hardness can reach 6-6.5. Its melting point is as high as 2996, second only to tungsten and rhenium, ranking third. Tantalum is malleable and can be drawn into a thin wire-like foil. Its coefficient of thermal expansion is very small. It only expands by 6.6% per degree Celsius. In addition, its toughness is very strong, even better than copper. Tantalum also has extremely high corrosion resistance. It does not react to hydrochloric acid, concentrated nitric acid and "aqua regia" regardless of whether it is under cold or hot conditions.


Application
Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic system.

Standard sizes
Thickness (0.15~6.0)mm × width (50~300)mm×length (50~1000)mm, customer's special size and requirements can be negotiated

Product Name
molecular formula
Purity
Specification
 Rhenium Target
Re
4N-5N
Customized for plane target, rotating target, tube target, etc.
Tantalum target
Ta
3N-4N
 
Niobium target
Nb
3N-4N
 
Vanadium target
V
3N-4N
 
Titanium target
Ti
2N5-4N
 
Chromium target
Cr
2N5-4N
 
Copper target
Cu
3N-5N
 
Aluminum target
Al
2N5-4N
 
Cobalt target
Co
3N5
 
 Nickel target
Ni
3N-5N
 
Ruthenium target
Ru
3N-4N
 
Iridium target
Ir
3N-4N
 
Rhodium target
 
4N
 
Bismuth target
Bi
3N-4N
 
Palladium target
Pd
3N-4N
 
 Silver target
Ag
4N-5N
 
Gold target
Au
4N-5N
 

Ultra also provides a variety of alloy target and ceramic target customized
 

Company Profile

High Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film CoatingHigh Purity Tantalum Metal Sputtering Target for Thin Film Coating

Our Service

 


High Purity Tantalum Metal Sputtering Target for Thin Film Coating

 

 
 
 
 
 

FAQ


Q: Are you trading company or manufacturer ?
A: We are factory.

Q: How long is your delivery time?
A: Generally it is 3-7 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to
quantity.

Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample, but need pay the cost of sample and freight since our product is high value.

Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
If you have another question, pls feel free to contact us as below:

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Gold Member Since 2022

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Manufacturer/Factory
Registered Capital
12777788 RMB
Plant Area
1001~2000 square meters