| Purity: | >99.99% |
|---|---|
| Characteristic: | High Melting Point |
| Usage: | Mocvd |
| Powder: | Not Powder |
| Alloy: | Non-alloy |
| Secondary: | Non-secondary |
| Customization: |
|---|
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Application:Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporation coating, it has quite obvious advantages in many aspects, as a has developed to a mature technology, magnetron sputtering has been applied in many fields, such as in the semiconductor integrated circuit, solar photovoltaic, recording medium, graphic display, and has been widely applied in such aspects as the surface coating.
Rheniumet Ltd in the rhenium heater field, with a number of technical achievements and years of production and processing experience, for global customers to produce excellent quality, excellent performance, low prices of various rhenium parts, currently in Korea, Japan, Taiwan, the United States and other regions have a stable customer base.
Specification:Purity Re≥99.99%~99.999%, shape, size, density can be customized.
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