• Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional
  • Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional
  • Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional
  • Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional
  • Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional

Silicon Carbide Target Sic 99.9% Sputtering Coating Ceramic Target Size Specifications Are Optional

Type: Ceramic Target
Certification: ISO
Transport Package: Wooden Box Package
Specification: 99.95%
Trademark: rheniumet
Origin: China
Customization:
Gold Member Since 2022

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Manufacturer/Factory

Basic Info.

Model NO.
SiC
HS Code
4301962010
Production Capacity
10000piece/Year

Product Description

Silicon carbide target material
Silicon carbide is the third generation semiconductor material, with wide band gap, high thermal conductivity, high saturation electron drift speed, high critical breakdown electric field and low dielectric constant, good chemical stability, etc., in high frequency, high power, high temperature resistance, anti-radiation semiconductor devices and UV detector lamps have a wide range of applications

Specification:

 
 Physical properties  Color  black
 Density  3.22g/cm³
 Melting point  2830ºC
Technical specifications  Purity  99.5%
 Relative density  >99%
 Flatness of section  3.2Ra
 Tolerance  ±0.1mm
 grain size  well-distributed
 Material  SiC
Product Specification  Disc/table/rod: diameter <360mm thickness >1mm
 Rectangle/sheet/step shape (splicing) : length <300mm width <300mm thickness >1mm
 Pipe/ring/rotating target) : Outer diameter <360mm inner diameter >1mm wall thickness >1mm length >1mm
 According to the needs of users to customize, sample processing, to map processing
 Minimum order quantity  1 piece, large quantity discount
 Production process  Vacuum magnetic levitation melting, casting into ingot, thermal mechanical treatment and precision machining
 Applicable instruments:  various types of magnetron sputtering equipment
 Product advantages  1.Reliable quality, favorable price
 2.Vacuum melting, purification preparation, high purity, less impurities
 3.Compact rolling, less oxidation, molding plastic
 4.High relative density, uniform grain equiaxial, high consistency
 Product accessories  Official quotation/purchase and sales contract/packing list/Material analysis and inspection list/formal invoice
 Packing method  Vacuum packing/vacuum neutral packing/Special packing external reinforcement packing


Application field
Commonly used in aerospace, biomedical, military, automotive, electronics, new energy, integrated circuits, information storage and so on

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Gold Member Since 2022

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Manufacturer/Factory
Registered Capital
12777788 RMB
Plant Area
1001~2000 square meters