• 5n Wolfram Sputtering Target
  • 5n Wolfram Sputtering Target
  • 5n Wolfram Sputtering Target
  • 5n Wolfram Sputtering Target
  • 5n Wolfram Sputtering Target

5n Wolfram Sputtering Target

Application: Electronics, Industrial
Standard: GB
Purity: 99.999%
Alloy: Non-alloy
Shape: Powder
Type: Sputtering Target
Customization:
Gold Member Since 2022

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Overview

Basic Info.

Model NO.
W-5Ntarget
Transport Package
Wooden Box Package
Specification
99.999%
Trademark
rheniumet
Origin
China
HS Code
4301962010
Production Capacity
10000piece/Year

Product Description

Application:

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

 

Specification:

Name

Molecular formula Specification

Size

Relative density Grain size Defect rate
Tungsten target

W

4N(99.99%)

Inch

mm

≥99%

≯50µm

0

5N(99.999%)

D(6,8,10,12)

H(0.25,0.5,0.75)

Diameter 150~350

Thickness 6~25

Tungsten Titanium Target

WTi10

WTi20

4N(99.99%)

≥99%

≯50µm

0

4N5(99.995%)

 

 Chemical component 

           Specification grade

Chemical index

 W/(W+Ti)≥99.99%

 W/(W+Ti)≥99.995%

 W≥99.999%

Total trace impurities

≯100 ppm

≯50 ppm

≯10 ppm

Impurity index(ppm)

Max

Typical value Max Typical value Max Typical value

Radioactive elements

U

-

0.2

0.1

0.05

0.0008

0.0005

Th

-

0.2

0.1

0.05

0.0008

0.0005

Alkali metal elements

Li

1

0.05

0.02

0.01

0.01

0.003

Na

5

1

0.5

0.2

0.1

0.05

K

5

1

0.1

0.05

0.05

0.03

Mo,Re

10

5

10

5

1

0.5

Fe,Cr

10

5

5

3

0.5

0.3

Ca,Si,Cu,Ni,Al,Zn,Sn,Mn,Co,Hg,V

2

1

0.5

0.3

0.2

0.2

P,As,Se

2

1

0.5

0.2

0.2

0.2

B,Pb,Sb,Be,Ba,Bi,Cd,Ge,Nb,Pt,Mg,Zr,Au,In,Ga,Ag

1

0.5

0.5

0.1

0.1

0.1

All other individual elements

1

0.5

0.5

0.1

0.1

0.1

Gas analysis

(≯,ppm)

O

C

N

H

S

30

20

20

20

10

 

Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.



Company Profile

 
5n Wolfram Sputtering Target5n Wolfram Sputtering Target5n Wolfram Sputtering Target5n Wolfram Sputtering Target5n Wolfram Sputtering Target5n Wolfram Sputtering Target5n Wolfram Sputtering Target

Our Service

 

5n Wolfram Sputtering Target

FAQ

 

Q: Are you trading company or manufacturer ?
A: We are factory.

Q: How long is your delivery time?
A: Generally it is 3-7 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to
quantity.

Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample, but need pay the cost of sample and freight since our product is high value.

Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
If you have another question, pls feel free to contact us as below:


 

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