High Purity 99.999% Tungsten Sputtering Target, Tungsten Metal Sputtering Target

• Type: Metal Target
• Shape: Round
• Certification: ISO
• Purity: 99.999% Min
• Chemical Composition: W
• Transport Package: Vacuum Packed or Per Customer′s Request.
• Model NO.: UL-01
• Specification: Customized according to customer requirements
• Trademark: Rheniumet
• Origin: Hunan, China
• HS Code: 4301962010
• Production Capacity: 10000000 Kilogram/Kilograms Per Month

Product Description

Product Description

Application:

 

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually
applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal.
Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers,
diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors.
Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

 

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FAQ

Q: Are you trading company or manufacturer ?
A: We are factory.

Q: How long is your delivery time?
A: Generally it is 5-10 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to
quantity.

Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample for free charge but do not pay the cost of freight.

Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
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