| Customization: | Available |
|---|---|
| Type: | Metal Target |
| Shape: | Round/Square |
Suppliers with verified business licenses
[Application]
High purity tungsten target, high purity tungsten titanium alloy target and tungsten silicon composite target are usually fabricated by magnetron sputtering. Because of its high resistance to electron transfer, high temperature stability, and ability to form stable silicides, high purity tungsten or ultrapure tungsten (5 N or 6 N) is often used in the electronics industry in the form of thin films as gate, junction, transition, and barrier metals. Ultra-high purity tungsten and its silicides are also used in vlsi as resistance layer, diffusion barrier layer, gate material and connection material in MOS transistors. Tungsten and titanium alloy sputtering targets are often used to make the transition metal layer of thin-film solar cells.
[Specification]
|
Name |
Molecular formula | Specification |
Size |
Relative density | Grain size | Defect rate | |
| Tungsten target |
W |
4N(99.99%) |
Inch |
mm |
≥99% |
≯50µm |
0 |
|
5N(99.999%) |
D(2,3,4,6,8,10,12)
H(0.25,0.5,0.75) |
Diameter :
50~350
Thickness:
6~25
|
|||||
| Tungsten Titanium Target |
WTi10 WTi20 |
4N(99.99%) |
≥99% |
≯50µm |
0 |
||
|
4N5(99.995%) |
|||||||
Chemical Composition
|
Specification grade Chemical index |
W/(W+Ti)≥99.99% |
W/(W+Ti)≥99.995% |
W≥99.999% |
|||||||||
| Total trace impurities |
≯100 ppm |
≯50 ppm |
≯10 ppm |
|||||||||
|
Impurity index(ppm) |
Max |
Typical value | Max | Typical value | Max | Typical value | ||||||
|
Radioactive elements |
U |
- |
0.2 |
0.1 |
0.05 |
0.0008 |
0.0005 |
|||||
|
Th |
- |
0.2 |
0.1 |
0.05 |
0.0008 |
0.0005 |
||||||
|
Alkali metal elements |
Li |
1 |
0.05 |
0.02 |
0.01 |
0.01 |
0.003 |
|||||
|
Na |
5 |
1 |
0.5 |
0.2 |
0.1 |
0.05 |
||||||
|
K |
5 |
1 |
0.1 |
0.05 |
0.05 |
0.03 |
||||||
|
Mo,Re |
10 |
5 |
10 |
5 |
1 |
0.5 |
||||||
|
Fe,Cr |
10 |
5 |
5 |
3 |
0.5 |
0.3 |
||||||
|
Ca,Si,Cu,Ni,Al,Zn,Sn,Mn,Co,Hg,V |
2 |
1 |
0.5 |
0.3 |
0.2 |
0.2 |
||||||
|
P,As,Se |
2 |
1 |
0.5 |
0.2 |
0.2 |
0.2 |
||||||
|
B,Pb,Sb,Be,Ba,Bi,Cd,Ge,Nb,Pt,Mg,Zr,Au,In,Ga,Ag |
1 |
0.5 |
0.5 |
0.1 |
0.1 |
0.1 |
||||||
| All other individual elements |
1 |
0.5 |
0.5 |
0.1 |
0.1 |
0.1 |
||||||
|
Gas analysis (≯,ppm) |
O |
C |
N |
H |
S |
|||||||
|
500 |
20 |
20 |
20 |
10 |
||||||||
Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.
Q: Are you trading company or manufacturer ?
A: We are factory.
Q: How long is your delivery time?
A: Generally it is 3-7 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to
quantity.
Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample, but need pay the cost of sample and freight since our product is high value.
Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
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