99.95% IR Iridium Sputtering Target for Thin Film Deposition

Product Details
Customization: Available
Classification: Precious Metal
Transport Package: Wooden Box Package
Manufacturer/Factory
Gold Member Since 2022

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Registered Capital
12777788 RMB
Plant Area
1001~2000 square meters
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
  • 99.95% IR Iridium Sputtering Target for Thin Film Deposition
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Overview

Basic Info.

Specification
99.95%
Trademark
rheniumet
Origin
China
HS Code
4301962010
Production Capacity
10000piece/Year

Product Description

Iridium sputtering targets have the same characteristics as iridium metal. Iridium has a melting point as high as 2466 ° C, stable chemical properties, can maintain good mechanical properties in the atmosphere above 1600 ° C, and has good oxidation resistance at high temperatures, and can withstand the corrosion of strong acids, strong bases, melting reagents and high temperature silicates. It is a known corrosion-resistant metal and can resist any acid attack. Although only some molten salts and halogens corrode solid iridium, fine crushed iridium dust is more reactive and flammable.
 
Name: Iridium  CAS:7439-88-5
 Symbol:Ir  Thermal conductivity:147W/(m·K)
 Atomic weight:192.22  Density:22.56g/cm3
 Purity:3N5  Resistivity:47.1 nΩ·m (at 20 °C)
 
Specification  Status   Purity Size
High purity iridium Target  3N5 1-10 inches, unconventional size can be customized

 

Iridium sputtering target manufacturing process
Refining (three-layer electrolysis process) - melting and casting (resistance furnace - semi-continuous casting) - grain refinement (thermomechanical treatment) - cleaning - Final packaging - cleaning for vacuum

Application of iridium sputtering targets
Iridium sputtering targets are used for thin film deposition, commonly used in fuel cells, decoration, semiconductors, displays, LED and photovoltaic equipment, glass coatings, etc.
 

Other applications of iridium include:
- Hardener for special alloys.
- An iridium alloy used to support compasses and pens.
- Iridium crucible.
- Iridium film, used as a protective film or heavy electrical contact.
- Fuel cells.
 

Topical chemical analysis 

Impurity element ≯(%)
Pt Ru Rh Pd Au Ag Cu Fe Ni
0.02 0.02 0.02 0.01 0.01 0.005 0.005 0.005 0.005
Al Pb Mn Mg Sn Si Zn Ca  
0.005 0.005 0.005 0.005 0.005 0.005 0.005 0.005  

Company Profile

 
99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition99.95% IR Iridium Sputtering Target for Thin Film Deposition

Our Service

 

99.95% IR Iridium Sputtering Target for Thin Film Deposition

FAQ

 

Q: Are you trading company or manufacturer ?
A: We are factory.

Q: How long is your delivery time?
A: Generally it is 3-7 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to
quantity.

Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample, but need pay the cost of sample and freight since our product is high value.

Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.
If you have another question, pls feel free to contact us as below:

 

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